Inventor
DE SILVA EKMINI A
US53 patents
Patents
50 patentsUS10490447B1Nov 26, 2019
Airgap formation in BEOL interconnect structure using sidewall image transfer
IBM11 citations84
US10176997B1Jan 8, 2019
Direct gate patterning for vertical transport field effect transistor
IBM12 citations84
US11227892B2Jan 18, 2022
MRAM integration with BEOL interconnect including top via
IBM2 citations73
US10741454B2Aug 11, 2020
Boundary protection for CMOS multi-threshold voltage devices
IBM2 citations73
US10727317B2Jul 28, 2020
Bottom contact formation for vertical transistor devices
IBM4 citations73
US10678135B2Jun 9, 2020
Surface treatment of titanium containing hardmasks
IBM2 citations73
US10388510B2Aug 20, 2019
Wet strippable OPL using reversible UV crosslinking and de-crosslinking
IBM3 citations73
US10998191B2May 4, 2021
Graded hardmask interlayer for enhanced extreme ultraviolet performance
IBM3 citations72
US10734523B2Aug 4, 2020
Nanosheet substrate to source/drain isolation
IBM6 citations72
US10579764B2Mar 3, 2020
Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks
IBM3 citations72
US9941142B1Apr 10, 2018
Tunable TiOxNy hardmask for multilayer patterning
IBM3 citations72
US10254652B2Apr 9, 2019
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
IBM3 citations71
US10082736B2Sep 25, 2018
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
IBM3 citations71
US9799534B1Oct 24, 2017
Application of titanium-oxide as a patterning hardmask
IBM2 citations71
US10903111B2Jan 26, 2021
Semiconductor device with linerless contacts
IBM4 citations70
US10782613B2Sep 22, 2020
Polymerizable self-assembled monolayers for use in atomic layer deposition
IBM3 citations68
US11022887B2Jun 1, 2021
Tunable adhesion of EUV photoresist on oxide surface
IBM0 citations63
US10886169B2Jan 5, 2021
Airgap formation in BEOL interconnect structure using sidewall image transfer
IBM1 citations63
US10551742B2Feb 4, 2020
Tunable adhesion of EUV photoresist on oxide surface
IBM1 citations63
US12426320B2Sep 23, 2025
Vertically stacked fin semiconductor devices
IBM0 citations62
US12019376B2Jun 25, 2024
Polymer brush adhesion promoter with UV cleavable linker
IBM0 citations62
US11681213B2Jun 20, 2023
EUV pattern transfer using graded hardmask
IBM0 citations62
US11556057B2Jan 17, 2023
Surface treatment of titanium containing hardmasks
IBM0 citations62
US11404317B2Aug 2, 2022
Method for fabricating a semiconductor device including self-aligned top via formation at line ends
IBM0 citations62
US11367617B2Jun 21, 2022
Graded hardmask interlayer for enhanced extreme ultraviolet performance
IBM0 citations62
US11199778B2Dec 14, 2021
Polymer brush adhesion promoter with UV cleavable linker
IBM0 citations62
US11131919B2Sep 28, 2021
Extreme ultraviolet (EUV) mask stack processing
IBM1 citations62
US11121024B2Sep 14, 2021
Tunable hardmask for overlayer metrology contrast
IBM0 citations62
US11081566B2Aug 3, 2021
Self-aligned contacts for vertical field effect transistors
IBM0 citations62
US11075266B2Jul 27, 2021
Vertically stacked fin semiconductor devices
IBM0 citations62
US10831102B2Nov 10, 2020
Photoactive polymer brush materials and EUV patterning using the same
IBM1 citations62
US10692755B2Jun 23, 2020
Selective deposition of dielectrics on ultra-low k dielectrics
IBM1 citations62
US10249512B2Apr 2, 2019
Tunable TiOxNy hardmask for multilayer patterning
IBM1 citations62
US10366879B2Jul 30, 2019
Dry and wet etch resistance for atomic layer deposited TiO2 for SIT spacer application
IBM1 citations61
US11688632B2Jun 27, 2023
Semiconductor device with linerless contacts
IBM0 citations60
US10923401B2Feb 16, 2021
Gate cut critical dimension shrink and active gate defect healing using selective deposition
IBM1 citations59
US11187983B2Nov 30, 2021
EUV patterning of monolayers for selective atomic layer deposition
IBM0 citations58
US11062946B2Jul 13, 2021
Self-aligned contact on a semiconductor device
IBM0 citations57
US10699912B2Jun 30, 2020
Damage free hardmask strip
IBM0 citations52
US10685872B2Jun 16, 2020
Electrically isolated contacts in an active region of a semiconductor device
IBM0 citations52
US10665505B2May 26, 2020
Self-aligned gate contact isolation
IBM0 citations52
US10629489B2Apr 21, 2020
Approach to prevent collapse of high aspect ratio Fin structures for vertical transport Fin field effect transistor devices
IBM0 citations52
US10622248B2Apr 14, 2020
Tunable hardmask for overlayer metrology contrast
IBM0 citations52
US10586697B2Mar 10, 2020
Wet strippable OPL using reversible UV crosslinking and de-crosslinking
IBM0 citations52
US10832945B2Nov 10, 2020
Techniques to improve critical dimension width and depth uniformity between features with different layout densities
IBM0 citations51
US10539884B2Jan 21, 2020
Post-lithography defect inspection using an e-beam inspection tool
IBM0 citations51
US10361127B1Jul 23, 2019
Vertical transport FET with two or more gate lengths
IBM0 citations51
US10578981B2Mar 3, 2020
Post-lithography defect inspection using an e-beam inspection tool
IBM0 citations50
US10354885B2Jul 16, 2019
Hard masks for block patterning
IBM0 citations50
US10090164B2Oct 2, 2018
Hard masks for block patterning
IBM0 citations50
Showing the top 50 of 53 patents by PatentIndex Score.