Inventor

HIRATA KAORU

JP66 patents

⚠️ This page may combine multiple inventors who share the name “HIRATA KAORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HIRATA KAORU

FUJIKIN KK

Pressure type flow control system with flow monitoring

Valve with built-in orifice, and pressure-type flow rate control device

Gas divided flow supplying apparatus for semiconductor manufacturing equipment

Pressure type flow control system with flow monitoring

Pressure-type flow control device and method for preventing overshooting at start of flow control performed by said device

Pressure type flow control system with flow monitoring, and method for detecting anomaly in fluid supply system and handling method at abnormal monitoring flow rate using the same

Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith

Method for detecting abnormality in fluid supply line using fluid control apparatus with pressure sensor

Corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed

Corrosion resistant metal made thermal type mass flow rate sensor and a fluid supply device using the same

Oscillatory type pressure sensor

Flow rate range variable type flow rate control apparatus

Flow rate control method and flow rate control device

Flow rate control device

Piezoelectric-element-driven valve and flow rate control device

Pressure-based flow rate control device and malfunction detection method therefor

Pressure-type flow rate control device

Pressure-type flow controller

Pressure type flow control system with flow monitoring, and method for detecting anomaly in fluid supply system and handling method at abnormal monitoring flow rate using the same

Pressure-type flow rate control device

Piezoelectric element-driven valve and flow rate control device including piezoelectric element-driven valve

Multi-hole orifice plate for flow control, and flow controller using the same

Raw material gas supply apparatus for semiconductor manufacturing equipment

Flow rate signal correction method and flow rate control device employing same

Flow rate range variable type flow rate control apparatus

Flow rate range variable type flow rate control apparatus

Pressure control device

Piezoelectric driven valve, pressure-type flow rate control device, and vaporization supply device

Flow rate control device

Flow rate control device

Fluid control device

Liquid level indicator and liquid raw material vaporization feeder

Liquid level detection circuit, liquid level meter, container provided with liquid level meter, and vaporizer using container

Controller and vaporization supply device

Flow rate control device and flow rate control method

Flow rate control device and flow rate control method

HIRATA KAORU

Flow rate ratio variable type fluid supply apparatus

Automatic pressure regulator for flow rate regulator

MATSUMOTO ATSUSHI

Normally open type piezoelectric element driven metal diaphragm control valve

Piezoelectric element driven metal diaphragm control valve

OHMI TADAHIRO

Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employed

Flow rate range variable type flow rate control apparatus

NAGASE MASAAKI

Method for detecting malfunction of valve on the downstream side of throttle mechanism of pressure type flow control apparatus

Raw material vaporizing and supplying apparatus equipped with raw material concentration

MITSUBISHI RAYON CO

Fragrant fiber

NAGATA ATSUSHI

Gas supply apparatus equipped with vaporizer

HIDAKA ATSUSHI

Piezoelectrically driven valve and piezoelectrically driven flow rate control device

SAWADA YOHEI

Piezoelectric driven control valve

NISHINO KOUJI

Gas supply system for semiconductor manufacturing facilities

SUGITA KATSUYUKI

Pressure control valve driving circuit for pressure type flow rate control device with flow rate self-diagnosis function