Inventor

HATANO TATSUO

JP55 patents

⚠️ This page may combine multiple inventors who share the name “HATANO TATSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HATANO TATSUO

TOKYO ELECTRON LTD

Film forming and dry cleaning apparatus and method

Process-gas supply apparatus

Shower head and film forming apparatus using the same

Liquid material supply apparatus and method

Method for forming a CVD film

Liquid material supply apparatus and method

Cleaning processing method of a film forming apparatus

Apparatus for removing tramp materials and method therefor

Substrate transfer apparatus and substrate processing system

Film deposition method and film deposition apparatus of metal film

Plasma sputtering film deposition method and equipment

Vacuum transfer device, substrate processing system, and substrate processing method

Substrate transfer apparatus, substrate transfer method, and substrate processing system

Substrate transport apparatus, substrate transport method, and substrate processing system

CVD method for forming metal film by using metal carbonyl gas

CVD film formation method

Method of forming multilayered film

Method for manufacturing semiconductor device

CVD film forming method including annealing and film forming performed at substantially the same pressure

Vacuum transfer device and substrate processing system

Metal recovery method, metal recovery apparatus, gas exhaust system and film forming device using same

Film forming method, plasma film forming apparatus and storage medium

Deposition method for forming a film including metal, nitrogen and carbon

Barrier metal layer

Substrate transfer apparatus and substrate processing system

Method for forming copper film

CVD process capable of reducing incubation time

Film forming apparatus and film forming method

Substrate transfer device and substrate processing system

Sputtering method and sputtering apparatus

Stage device and processing apparatus

Method of forming later insulating films for MTJ

Method and processing apparatus for performing pre-treatment to form copper wiring in recess formed in substrate

Film forming method using reversible decomposition reaction

Method of supplying cobalt to recess

Method for forming Cu wiring

CV method using metal carbonyl gas

Film formation method

IBM

Low-pressure deposition of metal layers from metal-carbonyl precursors

Method of forming a metal layer using an intermittent precursor gas flow process

Method of depositing metal layers from metal-carbonyl precursors

ISHIZAKA TADAHIRO

Methods of forming copper wiring and copper film, and film forming system

Method of forming copper wiring and method and system for forming copper film

Semiconductor device manufacturing method

KOJIMA YASUHIKO

Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, computer program and storage medium

Film forming method, film forming apparatus and storage medium

GOMI ATSUSHI

Mounting table structure, film forming apparatus and raw material recovery method

Film formation method and film formation apparatus

CENTRAL GLASS CO LTD

Cleaning gas and method for cleaning vacuum treatment apparatus by flowing the cleaning gas

HARA MASAMICHI

Method for film formation, apparatus for film formation, and computer-readable recording medium