P

Inventor

HISHIDA ARITAKA

JP8 patents
⚠️ This page may combine multiple inventors who share the name “HISHIDA ARITAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AZ ELECTRONIC MATERIALS USA

3 patents
US7824837B2Nov 2, 2010

Positive-working photoimageable bottom antireflective coating

AZ ELECTRONIC MATERIALS USA54 citations95
US7691556B2Apr 6, 2010

Antireflective compositions for photoresists

AZ ELECTRONIC MATERIALS USA29 citations91
US8039202B2Oct 18, 2011

Positive-working photoimageable bottom antireflective coating

AZ ELECTRONIC MATERIALS USA11 citations81

MERCK PATENT GMBH

2 patents
US11698586B2Jul 11, 2023

Negative-working ultra thick film photoresist

MERCK PATENT GMBH0 citations47
US12441822B2Oct 14, 2025

Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition

MERCK PATENT GMBH0 citations45

CLARIANT INT LTD

1 patent
US6358665B1Mar 19, 2002

Radiation-sensitive composition of chemical amplification type

CLARIANT INT LTD125 citations96

LIU WEIHONG

1 patent
US8841062B2Sep 23, 2014

Positive working photosensitive material

LIU WEIHONG6 citations67

AZ ELECTRONIC MAT LUXEMBOURG SARL

1 patent
US10976662B2Apr 13, 2021

Positive working photosensitive material

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations58