Inventor

BANINE VADIM YEVGENYEVICH

NL185 patents

⚠️ This page may combine multiple inventors who share the name “BANINE VADIM YEVGENYEVICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BANINE VADIM YEVGENYEVICH

ASML NETHERLANDS BV

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus and device manufacturing method

Lithographic projection apparatus and particle barrier for use therein

Lithographic projection apparatus, device manufacturing method, and device manufactured thereby

Lithographic apparatus having a monitoring device for detecting contamination

Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby

Lithographic apparatus and device manufacturing method

Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby

Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane

Pellicle for reticle and multilayer mirror

Lithographic apparatus, programmable patterning device and lithographic method

Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus

Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus

Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap

Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris

Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface

Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby

Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method

Pellicle for reticle and multilayer mirror

Pellicle, lithographic apparatus and device manufacturing method

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus and cleaning method therefor

Anti-reflection coating for an EUV mask

Lithographic apparatus and cleaning method therefor

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby

Metrology methods, radiation source, metrology apparatus and device manufacturing method

Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement

Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement

Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane

Electron injector and free electron laser

Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby

Radiation source, lithographic apparatus and device manufacturing method

Radiation system and lithographic apparatus

Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus

Lithographic apparatus, contaminant trap, and device manufacturing method

ZEISS CARL SMT AG

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

Illumination system with a plurality of individual gratings

YAKUNIN ANDREI MIKHAILOVICH

Lithographic apparatus and method

DE JAGER PIETER WILLEM HERMAN

Lithographic apparatus, programmable patterning device and lithographic method

DEN BOEF ARIE JEFFREY

Imprint lithography

BANINE VADIM YEVGENYEVICH

Radiation source, lithographic apparatus and device manufacturing method

VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

SJMAENOK LEONID AIZIKOVITCH

Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element

SWINKELS GERARDUS HUBERTUS PETRUS MARIA

Radiation source and lithographic apparatus

DONDERS SJOERD NICOLAAS LAMBERTUS

Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method