Inventor

NIENHUYS HAN-KWANG

NL31 patents

⚠️ This page may combine multiple inventors who share the name “NIENHUYS HAN-KWANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIENHUYS HAN-KWANG

ASML NETHERLANDS BV

Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter

Radiation beam apparatus

Particle traps and barriers for particle suppression

Optical systems, metrology apparatus and associated method

Lithographic method

Method and apparatus for detecting substrate surface variations

Beam delivery apparatus and method

Metrology measurement method and apparatus

Lithographic apparatus and method of manufacturing a device

Lithographic apparatus

Beam splitting apparatus

Reflector

Method of measuring a parameter of a lithographic process, metrology apparatus

Radiation system

Radiation source

Radiation system

Method and apparatus for determining a radiation beam intensity profile

Radiation sensor apparatus

Manufacturing a reflective diffraction grating

Attenuation apparatus and method

Component for a radiation source, associated radiation source and lithographic apparatus

Particle suppression systems and methods

Measurement system, lithographic apparatus and device manufacturing method

Radiation sensor apparatus

Undulator

NIENHUYS HAN-KWANG

Lithographic apparatus and device manufacturing method

Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient

Lithographic apparatus and device manufacturing method

Lithographic apparatus configured to suppress contamination from passing into the projection system and method

ASML HOLDING NV

Contaminant detection metrology system, lithographic apparatus, and methods thereof

LOOPSTRA ERIK ROELOF

Lithographic apparatus and method