Inventor
TANAKA SUMI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “TANAKA SUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS7837828B2Nov 23, 2010
Substrate supporting structure for semiconductor processing, and plasma processing device
TOKYO ELECTRON LTD194 citations99
US5647945AJul 15, 1997
Vacuum processing apparatus
TOKYO ELECTRON LTD308 citations98
US6036782AMar 14, 2000
Shower head
TOKYO ELECTRON LTD109 citations97
US5951772ASep 14, 1999
Vacuum processing apparatus
TOKYO ELECTRON LTD104 citations97
US5332442AJul 26, 1994
Surface processing apparatus
TOKYO ELECTRON LTD139 citations97
US5525160AJun 11, 1996
Film deposition processing device having transparent support and transfer pins
TOKYO ELECTRON LTD78 citations95
US6733593B1May 11, 2004
Film forming device
TOKYO ELECTRON LTD21 citations92
US5972114AOct 26, 1999
Film deposition apparatus with anti-adhesion film and chamber cooling means
TOKYO ELECTRON LTD32 citations92
US4901011AFeb 13, 1990
Carrier for transferring plate-like objects one by one, a handling apparatus for loading or unloading the carrier, and a wafer probing machine fitted with the handling apparatus for the wafer carrier
TOKYO ELECTRON LTD30 citations92
US7547860B2Jun 16, 2009
Microwave plasma processing apparatus for semiconductor element production
TOKYO ELECTRON LTD7 citations74
US4950982AAug 21, 1990
Electric probing test machine
TOKYO ELECTRON LTD18 citations74
US6042653AMar 28, 2000
Susceptor for bearing an object to be processed thereon
TOKYO ELECTRON LTD12 citations72
US7250094B2Jul 31, 2007
Heat treatment apparatus
TOKYO ELECTRON LTD6 citations71
US11538667B2Dec 27, 2022
Stage, plasma processing apparatus, and plasma processing method
TOKYO ELECTRON LTD0 citations62
US11929234B2Mar 12, 2024
Plasma processing apparatus and lower stage
TOKYO ELECTRON LTD0 citations52
US7842229B2Nov 30, 2010
Substrate processing apparatus and substrate rotating device
TOKYO ELECTRON LTD1 citations51
US7769279B2Aug 3, 2010
Heat treatment apparatus
TOKYO ELECTRON LTD1 citations50
US12094694B2Sep 17, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations49
US7618494B2Nov 17, 2009
Substrate holding structure and substrate processing device
TOKYO ELECTRON LTD0 citations42