Inventor
HILD KERSTIN
DE16 patents
Patents
16 patentsUS10908509B2Feb 2, 2021
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH3 citations72
US10852643B2Dec 1, 2020
Optical system, and method
ZEISS CARL SMT GMBH3 citations72
US9785054B2Oct 10, 2017
Mirror, more particularly for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH3 citations72
US10684466B2Jun 16, 2020
Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement
ZEISS CARL SMT GMBH3 citations67
US11366395B2Jun 21, 2022
Mirror, in particular for a microlithographic projection exposure system
ZEISS CARL SMT GMBH1 citations62
US11029515B2Jun 8, 2021
Optical element, and method for correcting the wavefront effect of an optical element
ZEISS CARL SMT GMBH0 citations62
US10331048B2Jun 25, 2019
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations59
US12546921B2Feb 10, 2026
Mirror assembly and optical assembly comprising same
ZEISS CARL SMT GMBH0 citations56
US11360393B2Jun 14, 2022
Mirror, in particular for a microlithographic projection exposure system
ZEISS CARL SMT GMBH1 citations56
US11187990B2Nov 30, 2021
Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror
ZEISS CARL SMT GMBH1 citations54
US12210289B2Jan 28, 2025
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations49
US12276917B2Apr 15, 2025
Mirror, in particular for microlithography
ZEISS CARL SMT GMBH0 citations48
US11328831B2May 10, 2022
Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus
ZEISS CARL SMT GMBH0 citations47
US10146138B2Dec 4, 2018
Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations47
US11137687B2Oct 5, 2021
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
ZEISS CARL SMT GMBH0 citations46
US12411417B2Sep 9, 2025
Projection objective including an optical device
ZEISS CARL SMT GMBH0 citations45