Inventor
KE JHIH JHENG
TW4 patents
Patents
4 patentsUS12024693B2Jul 2, 2024
Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN
BASF SE0 citations46
US11377624B2Jul 5, 2022
Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process
BASF SE0 citations46
US12331239B2Jun 17, 2025
Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt
BASF SE0 citations45
US12590274B2Mar 31, 2026
Composition and process for selectively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten
BASF SE0 citations44