Inventor
LEBLANC RENE E
US8 patents
⚠️ This page may combine multiple inventors who share the name “LEBLANC RENE E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
3 patentsUS5665640ASep 9, 1997
Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
SONY CORP128 citations99
US5567243AOct 22, 1996
Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
SONY CORP366 citations99
US5716870AFeb 10, 1998
Method for producing titanium thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
SONY CORP29 citations92
MATERIALS RESEARCH CORP
3 patentsUS5370739ADec 6, 1994
Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD
MATERIALS RESEARCH CORP188 citations98
US5273588ADec 28, 1993
Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means
MATERIALS RESEARCH CORP228 citations98
US5356476AOct 18, 1994
Semiconductor wafer processing method and apparatus with heat and gas flow control
MATERIALS RESEARCH CORP151 citations97
TOKYO ELECTRON LTD
2 patentsUS5866213AFeb 2, 1999
Method for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
TOKYO ELECTRON LTD140 citations99
US6220202B1Apr 24, 2001
Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition
TOKYO ELECTRON LTD29 citations92