Inventor

KATAYAMA MASATAKE

JP24 patents

⚠️ This page may combine multiple inventors who share the name “KATAYAMA MASATAKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KATAYAMA MASATAKE

SHINETSU HANDOTAI KK

Method of chemical vapor deposition and reactor therefor

Method for smoothing surface of silicon single crystal substrate

Method of making bonded wafers

SOI substrate and manufacturing method therefor

Method for vapor phase growth

Method of fabricating bonded wafer

Method for vapor phase growth

Method and apparatus for production of extremely thin SOI film substrate

Apparatus for production of extremely thin SOI film substrate

Method for controlling thickness of single crystal thin-film layer in soi substrate

Method for production of dielectric-separation substrate

Method for production of dielectric-separation substrate

Method for production of SOI substrate

Method of fabricating soi substrate with uniform thin silicon film

SOI wafer and method for the preparation thereof

Method of estimating quantity of boron at bonding interface in bonded wafer

Heat treatment jig for semiconductor wafers and a method for treating a surface of the same

Method of making a SOI film having a more uniform thickness in a SOI substrate

Method of boron diffusion into semiconductor wafers having reduced stacking faults

Method for producing semiconductor substrate

Method for vapor-phase growth

Method and apparatus for thin film growth

SHIN ETSU HANDOTUI CO LTD

Dielectrically isolated substrate and a process for producing the same

SHIN ETSU HANDOTAI LTD

Method of chemical vapor deposition