Inventor
MOROGA ISAO
JP3 patents
Patents
3 patentsUS5393370AFeb 28, 1995
Method of making a SOI film having a more uniform thickness in a SOI substrate
SHINETSU HANDOTAI KK15 citations71
US5171708ADec 15, 1992
Method of boron diffusion into semiconductor wafers having reduced stacking faults
SHINETSU HANDOTAI KK11 citations68
US5696034ADec 9, 1997
Method for producing semiconductor substrate
SHINETSU HANDOTAI KK8 citations65