Inventor · disambiguated record
Donna L. Smatlak
Also filed as: SMATLAK DONNA · SMATLAK DONNA L
12 granted patents·1 pending application·572 citations·filing 1989–2006
93Inventor score
Top patents by PatentIndex Score
13 records- 0198US5061838AToroidal electron cyclotron resonance reactorMASSACHUSETTS INST TECHNOLOGY·Filed 1989·Granted Oct 29, 1991·360 cites·33 claims
- 0293US6791094B1Method and apparatus for determining beam parallelism and directionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2000·Granted Sep 14, 2004·63 cites·25 claims
- 0390US7459704B2Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atomsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Dec 2, 2008·17 cites·36 claims
- 0483US7402816B2Electron injection in ion implanter magnetsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Jul 22, 2008·7 cites·24 claims
- 0582US7655922B2Techniques for confining electrons in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Feb 2, 2010·9 cites·19 claims
- 0678US7462844B2Method, system, and apparatus for improving doping uniformity in high-tilt ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Dec 9, 2008·6 cites·26 claims
- 0777US7683347B2Technique for improving ion implantation throughput and dose uniformityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Mar 23, 2010·4 cites·49 claims
- 0875US7166854B2Uniformity control multiple tilt axes, rotating wafer and variable scan velocityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Jan 23, 2007·17 cites·20 claims
- 0972US5479254AContinuous, real time microwave plasma element sensorFiled 1993·Granted Dec 26, 1995·35 cites·24 claims
- 1061US7161161B2Uniformity control using multiple fixed wafer orientations and variable scan velocityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Jan 9, 2007·7 cites·22 claims
- 1157US6403972B1Methods and apparatus for alignment of ion beam systems using beam current sensorsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1999·Granted Jun 11, 2002·20 cites·34 claims
- 1245US5256854ATunable plasma method and apparatus using radio frequency heating and electron beam irradiationMASSACHUSETTS INST TECHNOLOGY·Filed 1990·Granted Oct 26, 1993·27 cites·20 claims
- 1342US2005205211A1Plasma immersion ion implantion apparatus and methodSINGH VIKRAM·Filed 2004·Application pending·0 cites
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