Inventor
LAI EN HAO
TW4 patents
Patents
4 patentsUS11029324B2Jun 8, 2021
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US12085585B2Sep 10, 2024
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11680958B2Jun 20, 2023
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US12436164B2Oct 7, 2025
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62