Inventor · disambiguated record
Rebecca D. Mih
Also filed as: MIH REBECCA · MIH REBECCA D · MIH REBECCA DORA
24 granted patents·2 pending applications·447 citations·filing 1997–2013
96Inventor score
Top patents by PatentIndex Score
26 records- 0191US6504207B1Method to create EEPROM memory structures integrated with high performance logic and NVRAM, and operating conditions for the sameIBM·Filed 2000·Granted Jan 7, 2003·67 cites·10 claims
- 0289US6326275B1DRAM cell with vertical CMOS transistorIBM·Filed 2000·Granted Dec 4, 2001·47 cites·8 claims
- 0374US6407396B1Wafer metrology structureIBM·Filed 1999·Granted Jun 18, 2002·45 cites·22 claims
- 0473US6268261B1Microprocessor having air as a dielectric and encapsulated lines and process for manufactureIBM·Filed 1998·Granted Jul 31, 2001·36 cites·23 claims
- 0568US8110321B2Method of manufacture of damascene reticlePETRARCA KEVIN S·Filed 2007·Granted Feb 7, 2012·2 cites·20 claims
- 0668US6429067B1Dual mask process for semiconductor devicesIBM·Filed 2001·Granted Aug 6, 2002·15 cites·10 claims
- 0767US6429522B2Microprocessor having air as a dielectric and encapsulated linesIBM·Filed 2000·Granted Aug 6, 2002·12 cites·5 claims
- 0867US6391703B1Buried strap for DRAM using junction isolation techniqueIBM·Filed 2001·Granted May 21, 2002·11 cites·7 claims
- 0967US6015991AAsymmetrical field effect transistorIBM·Filed 1997·Granted Jan 18, 2000·33 cites·20 claims
- 1066US6221780B1Dual damascene flowable oxide insulation structure and metallic barrierIBM·Filed 1999·Granted Apr 24, 2001·27 cites·26 claims
- 1162US6228745B1Selective reduction of sidewall slope on isolation edgeIBM·Filed 1999·Granted May 8, 2001·27 cites·4 claims
- 1262US5948571AAsymmetrical resist sidewallIBM·Filed 1997·Granted Sep 7, 1999·23 cites·10 claims
- 1360US6727589B2Dual damascene flowable oxide insulation structure and metallic barrierIBM·Filed 2000·Granted Apr 27, 2004·6 cites·24 claims
- 1459US8815475B2Reticle carrierIBM·Filed 2013·Granted Aug 26, 2014·0 cites·7 claims
- 1555US6258732B1Method of forming a patterned organic dielectric layer on a substrateIBM·Filed 1999·Granted Jul 10, 2001·19 cites·23 claims
- 1654US5985492AMulti-phase maskIBM·Filed 1998·Granted Nov 16, 1999·19 cites·17 claims
- 1753US6132940AMethod for producing constant profile sidewallsIBM·Filed 1998·Granted Oct 17, 2000·14 cites·14 claims
- 1852US8439728B2Reticle carrierPETRARCA KEVIN S·Filed 2011·Granted May 14, 2013·0 cites·13 claims
- 1952US6479884B2Interim oxidation of silsesquioxane dielectric for dual damascene processIBM·Filed 2001·Granted Nov 12, 2002·4 cites·4 claims
- 2049US6114096AAsymmetrical resist sidewallIBM·Filed 1998·Granted Sep 5, 2000·13 cites·16 claims
- 2148US6348736B1In situ formation of protective layer on silsesquioxane dielectric for dual damascene processIBM·Filed 1999·Granted Feb 19, 2002·13 cites·14 claims
- 2245US6329280B1Interim oxidation of silsesquioxane dielectric for dual damascene processIBM·Filed 1999·Granted Dec 11, 2001·10 cites·18 claims
- 2334US6284574B1Method of producing heat dissipating structure for semiconductor devicesIBM·Filed 1999·Granted Sep 4, 2001·4 cites·5 claims
- 2430US6448629B2Semiconductor device and method of making sameIBM·Filed 1999·Granted Sep 10, 2002·0 cites·11 claims
- 2529US2002076621A1Localized partial coherence controlFiled 1999·Application pending·0 cites
- 2629US2002048707A1Controlled annular illuminationFiled 1999·Application pending·0 cites
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