Inventor
AOAI TOSHIAKI
JP109 patents
⚠️ This page may combine multiple inventors who share the name “AOAI TOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJI PHOTO FILM CO LTD
49 patentsUS6479211B1Nov 12, 2002
Positive photoresist composition for far ultraviolet exposure
FUJI PHOTO FILM CO LTD149 citations99
US6492091B2Dec 10, 2002
Positive photosensitive composition
FUJI PHOTO FILM CO LTD112 citations98
US5945250AAug 31, 1999
Positive photosensitive composition
FUJI PHOTO FILM CO LTD127 citations98
US5824451AOct 20, 1998
Positive photosensitive composition
FUJI PHOTO FILM CO LTD145 citations98
US5576143ANov 19, 1996
Light-sensitive composition
FUJI PHOTO FILM CO LTD133 citations98
US5529881AJun 25, 1996
Postive photoresist composition
FUJI PHOTO FILM CO LTD108 citations98
US6037098AMar 14, 2000
Positive photosensitive composition
FUJI PHOTO FILM CO LTD91 citations97
US6749987B2Jun 15, 2004
Positive photosensitive composition
FUJI PHOTO FILM CO LTD43 citations96
US6485883B2Nov 26, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD71 citations96
US6291130B1Sep 18, 2001
Positive photosensitive composition
FUJI PHOTO FILM CO LTD60 citations96
US6042991AMar 28, 2000
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD49 citations96
US5955238ASep 21, 1999
Waterless planographic printing plate and method of plate making using the same
FUJI PHOTO FILM CO LTD87 citations96
US5837420ANov 17, 1998
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD69 citations96
US5294511AMar 15, 1994
Photosensitive composition
FUJI PHOTO FILM CO LTD106 citations96
US5110709AMay 5, 1992
Light-sensitive positive working composition containing a pisolfone compound
FUJI PHOTO FILM CO LTD77 citations96
US5002853AMar 26, 1991
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD80 citations96
US6852467B2Feb 8, 2005
Positive resist composition
FUJI PHOTO FILM CO LTD25 citations93
US6806022B1Oct 19, 2004
Positive photosensitive resin composition
FUJI PHOTO FILM CO LTD24 citations93
US6787283B1Sep 7, 2004
Positive photoresist composition for far ultraviolet exposure
FUJI PHOTO FILM CO LTD30 citations93
US6692884B2Feb 17, 2004
Positive photoresist composition
FUJI PHOTO FILM CO LTD28 citations93
US6596458B1Jul 22, 2003
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD58 citations93
US6517991B1Feb 11, 2003
Positive photosensitive composition
FUJI PHOTO FILM CO LTD36 citations93
US6265135B1Jul 24, 2001
Positive-working electron beam or X-ray resist composition
FUJI PHOTO FILM CO LTD39 citations93
US6242153B1Jun 5, 2001
Positive photoresist composition for far ultraviolet ray exposure
FUJI PHOTO FILM CO LTD40 citations93
US6238842B1May 29, 2001
Positive photosensitive composition
FUJI PHOTO FILM CO LTD27 citations93
US6159656ADec 12, 2000
Positive photosensitive resin
FUJI PHOTO FILM CO LTD33 citations93
US6136504AOct 24, 2000
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD30 citations93
US5981140ANov 9, 1999
Positive photosensitive composition
FUJI PHOTO FILM CO LTD31 citations93
US5891603AApr 6, 1999
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD27 citations93
US5707777AJan 13, 1998
Light-sensitive composition
FUJI PHOTO FILM CO LTD51 citations93
US5700620ADec 23, 1997
Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound
FUJI PHOTO FILM CO LTD25 citations93
US5693452ADec 2, 1997
Positive chemically amplified resist composition
FUJI PHOTO FILM CO LTD54 citations93
US5609982AMar 11, 1997
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD22 citations93
US4820607AApr 11, 1989
Photosolubilizable composition
FUJI PHOTO FILM CO LTD26 citations93
US6245485B1Jun 12, 2001
Positive resist composition
FUJI PHOTO FILM CO LTD24 citations92
US6013411AJan 11, 2000
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD32 citations92
US5939234AAug 17, 1999
Chemically amplified positive resist composition
FUJI PHOTO FILM CO LTD21 citations92
US5707776AJan 13, 1998
Positive resin composition sensitive to ultraviolet rays
FUJI PHOTO FILM CO LTD48 citations92
US5683856ANov 4, 1997
Positive-working photosensitive composition
FUJI PHOTO FILM CO LTD33 citations92
US4950582AAug 21, 1990
Light-sensitive composition
FUJI PHOTO FILM CO LTD28 citations92
US4877711AOct 31, 1989
Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
FUJI PHOTO FILM CO LTD46 citations92
US4766037AAug 23, 1988
Photodegradable microcapsules
FUJI PHOTO FILM CO LTD29 citations92
US4741985AMay 3, 1988
Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer.
FUJI PHOTO FILM CO LTD31 citations92
US6576392B1Jun 10, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD47 citations91
US6962766B2Nov 8, 2005
Positive photoresist composition
FUJI PHOTO FILM CO LTD17 citations84
US6824948B1Nov 30, 2004
Electron beam or X-ray negative-working resist composition
FUJI PHOTO FILM CO LTD17 citations84
US6808860B2Oct 26, 2004
Positive photoresist composition
FUJI PHOTO FILM CO LTD14 citations84
US6638683B1Oct 28, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD19 citations84
US6632586B1Oct 14, 2003
Positive resist composition
FUJI PHOTO FILM CO LTD15 citations84
FUJIFILM CORP
1 patentShowing the top 50 of 109 patents by PatentIndex Score.