Inventor
SUEHIRO NATSUMI
JP6 patents
Patents
6 patentsUS5663035ASep 2, 1997
Radiation-sensitive mixture comprising a basic iodonium compound
HOECHST JAPAN57 citations95
US5691100ANov 25, 1997
Pattern forming material including photoacid and photobase generators for large exposure latitude
HOECHST JAPAN63 citations94
US5738972AApr 14, 1998
Radiation sensitive composition
HOECHST JAPAN21 citations92
US5595855AJan 21, 1997
Radiation sensitive composition
HOECHST JAPAN24 citations92
US5843319ADec 1, 1998
Positive-working radiation-sensitive mixture
HOECHST JAPAN16 citations73
US5641594AJun 24, 1997
Colored, photosensitive resin composition
HOECHST JAPAN5 citations61