Inventor

YAMAGUCHI TAKAKO

JP28 patents

⚠️ This page may combine multiple inventors who share the name “YAMAGUCHI TAKAKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YAMAGUCHI TAKAKO

CANON KK

Near-field optical probe having surface plasmon polariton waveguide and method of preparing the same as well as microscope, recording/regeneration apparatus and micro-fabrication apparatus using the same

Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof

Chemical sensor

Near-field exposure photoresist and fine pattern forming method using the same

Photoresist, photolithography method using the same, and method for producing photoresist

Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probe

Exposure method and exposure apparatus using near-field light and exposure mask

Pattern-forming method using photomask, and pattern-forming apparatus

Pattern forming apparatus and pattern forming method

Sensor device and testing method utilizing localized plasmon resonance

Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array

Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method

Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method

Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same

Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device

Near-field exposure photoresist and fine pattern forming method using the same

Near-field exposure apparatus and near-field exposure photomask

Pattern-forming apparatus using a photomask

Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process

Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device

Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process

Photoresist, photolithography method using the same, and method for producing photoresist

Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production

HOUMURA TOSHIKAZU

Communication terminal, and dial registration method and dial registration program therefor

Communication terminal, and dial registration method and dial registration program therefor

Communication terminal, and dial registration method and dial registration program therefor

IKUTA MITSUHIRO

Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array

FUJITSU LTD

Communication terminal, and dial registration method and dial registration program therefor