P

Inventor

OGATA TOSHIYUKI

JP45 patents
⚠️ This page may combine multiple inventors who share the name “OGATA TOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

23 patents
US7264918B2Sep 4, 2007

Resist composition for liquid immersion exposure process and method of forming resist pattern therewith

TOKYO OHKA KOGYO CO LTD69 citations97
US6683202B2Jan 27, 2004

Fluorine-containing monomeric ester compound for base resin in photoresist composition

TOKYO OHKA KOGYO CO LTD8 citations74
US11359175B2Jun 14, 2022

Substrate, structure, structure-manufacturing method, cell-sorting method, cell-manufacturing method, and secretion-producing method

TOKYO OHKA KOGYO CO LTD2 citations73
US6787284B2Sep 7, 2004

Positive resist composition and base material carrying layer of the positive resist composition

TOKYO OHKA KOGYO CO LTD7 citations73
US10137665B2Nov 27, 2018

Method for manufacturing laminate, and laminate

TOKYO OHKA KOGYO CO LTD2 citations72
US6638684B2Oct 28, 2003

Photosensitive laminate, process for forming resist pattern using same and positive resist composition

TOKYO OHKA KOGYO CO LTD7 citations72
US7851129B2Dec 14, 2010

Resist composition, resist pattern forming method and compound

TOKYO OHKA KOGYO CO LTD2 citations63
US7932013B2Apr 26, 2011

Pattern coating material and pattern forming method

TOKYO OHKA KOGYO CO LTD3 citations62
US7851127B2Dec 14, 2010

Polymer compound, positive resist composition and resist pattern forming method

TOKYO OHKA KOGYO CO LTD2 citations62
US7723007B2May 25, 2010

Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method

TOKYO OHKA KOGYO CO LTD5 citations62
US7700259B2Apr 20, 2010

Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations62
US7592122B2Sep 22, 2009

Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition

TOKYO OHKA KOGYO CO LTD3 citations62
US7326512B2Feb 5, 2008

Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound

TOKYO OHKA KOGYO CO LTD4 citations62
US11612891B2Mar 28, 2023

Filter film and use thereof

TOKYO OHKA KOGYO CO LTD0 citations61
US11547968B2Jan 10, 2023

Gas separation method and gas separation membrane

TOKYO OHKA KOGYO CO LTD0 citations58
US7943284B2May 17, 2011

Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations52
US7919227B2Apr 5, 2011

Positive resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations52
US6846949B2Jan 25, 2005

Fluorine-containing monomeric ester compound for base resin in photoresist composition

TOKYO OHKA KOGYO CO LTD0 citations52
US7807328B2Oct 5, 2010

Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method

TOKYO OHKA KOGYO CO LTD0 citations51
US11384331B2Jul 12, 2022

Particle capture device

TOKYO OHKA KOGYO CO LTD0 citations50
US10793756B2Oct 6, 2020

Adhesive composition, adhesive film, and bonding method

TOKYO OHKA KOGYO CO LTD0 citations41
US8349543B2Jan 8, 2013

Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material

TOKYO OHKA KOGYO CO LTD0 citations41
US7700257B2Apr 20, 2010

Photoresist composition and resist pattern formation method by the use thereof

TOKYO OHKA KOGYO CO LTD0 citations41

FANUC LTD

11 patents

TAKAHASHI MOTOKI

2 patents

ASAHI HITOSHI

1 patent

NIPPON STEEL & SUMITOMO METAL CORP

1 patent

SHIONO DAIJU

1 patent

RIKEN

1 patent

DENGENSHA TOA CO LTD

1 patent

OGATA TOSHIYUKI

1 patent

IBM

1 patent

NAT UNIV CORP NARA INST

1 patent

NANOMEMBRANE TECHNOLOGIES INC

1 patent