P

Inventor

WU CHIH-NING

TW22 patents
⚠️ This page may combine multiple inventors who share the name “WU CHIH-NING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

20 patents
US7491615B2Feb 17, 2009

Method of fabricating strained-silicon transistors and strained-silicon CMOS transistors

UNITED MICROELECTRONICS CORP54 citations96
US6767825B1Jul 27, 2004

Etching process for forming damascene structure of the semiconductor

UNITED MICROELECTRONICS CORP26 citations92
US6635565B2Oct 21, 2003

Method of cleaning a dual damascene structure

UNITED MICROELECTRONICS CORP32 citations92
US6303482B1Oct 16, 2001

Method for cleaning the surface of a semiconductor wafer

UNITED MICROELECTRONICS CORP34 citations92
US6780761B1Aug 24, 2004

Via-first dual damascene process

UNITED MICROELECTRONICS CORP20 citations90
US6733597B2May 11, 2004

Method of cleaning a dual damascene structure

UNITED MICROELECTRONICS CORP11 citations74
US6554002B2Apr 29, 2003

Method for removing etching residues

UNITED MICROELECTRONICS CORP9 citations74
US7214988B2May 8, 2007

Metal oxide semiconductor transistor

UNITED MICROELECTRONICS CORP8 citations73
US7172976B2Feb 6, 2007

Extrusion-free wet cleaning process for copper-dual damascene structures

UNITED MICROELECTRONICS CORP5 citations73
US6794292B2Sep 21, 2004

Extrusion-free wet cleaning process for copper-dual damascene structures

UNITED MICROELECTRONICS CORP8 citations73
US6511916B1Jan 28, 2003

Method for removing the photoresist layer in the damascene process

UNITED MICROELECTRONICS CORP7 citations73
US7338910B2Mar 4, 2008

Method of fabricating semiconductor devices and method of removing a spacer

UNITED MICROELECTRONICS CORP6 citations63
US6692580B2Feb 17, 2004

Method of cleaning a dual damascene structure

UNITED MICROELECTRONICS CORP4 citations63
US6453915B1Sep 24, 2002

Post polycide gate etching cleaning method

UNITED MICROELECTRONICS CORP5 citations63
US7196019B2Mar 27, 2007

Method of removing spacers and fabricating MOS transistor

UNITED MICROELECTRONICS CORP2 citations59
US7544621B2Jun 9, 2009

Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method

UNITED MICROELECTRONICS CORP5 citations58
US6440873B1Aug 27, 2002

Post metal etch cleaning method

UNITED MICROELECTRONICS CORP1 citations52
US7595234B2Sep 29, 2009

Fabricating method for a metal oxide semiconductor transistor

UNITED MICROELECTRONICS CORP0 citations51
US7220647B2May 22, 2007

Method of cleaning wafer and method of manufacturing gate structure

UNITED MICROELECTRONICS CORP0 citations48
US7135400B2Nov 14, 2006

Damascene process capable of avoiding via resist poisoning

UNITED MICROELECTRONICS CORP0 citations35

NAT SCIENCE COUNCIL

1 patent

UNITED MICROELECTRONICS CORPS

1 patent