Inventor
INAMI HAJIME
JP2 patents
Patents
2 patentsUS12265331B2Apr 1, 2025
Radiation-sensitive resin composition and method for forming resist pattern
JSR CORP0 citations49
US11340528B2May 24, 2022
Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer
JSR CORP0 citations34