Inventor

MOORS JOHANNES HUBERTUS JOSEPHINA

NL58 patents

⚠️ This page may combine multiple inventors who share the name “MOORS JOHANNES HUBERTUS JOSEPHINA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MOORS JOHANNES HUBERTUS JOSEPHINA

ASML NETHERLANDS BV

Radical cleaning arrangement for a lithographic apparatus

Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus and cleaning method therefor

Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

Prolonging optical element lifetime in an EUV lithography system

Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system

Radiation source

Source-collector device, lithographic apparatus, and device manufacturing method

System and method for detecting at least one contamination species in a lithographic apparatus

Lithographic apparatus

Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby

Device manufacturing method, device manufactured thereby and a mask for use in the method

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Lithographic device, device manufacturing method and device manufactured thereby

Cleaning method, apparatus and cleaning system

Radiation system and lithographic apparatus

Optical apparatus, lithographic apparatus and device manufacturing method

Lithographic apparatus, and device manufacturing method

Lithographic apparatus, system and device manufacturing method

Radiation source

Prolonging optical element lifetime in an EUV lithography system

Radiation source, lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus, spectral purity filter and device manufacturing method

Module and method for producing extreme ultraviolet radiation

Lithographic apparatus

BANINE VADIM YEVGENYEVICH

Lithographic apparatus and device manufacturing method

System and method for detecting at least one contamination species in a lithographic apparatus

Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method

System and method for detecting at least one contamination species in a lithographic apparatus

Lithographic apparatus, spectral purity filter and device manufacturing method

ZEISS CARL SMT GMBH

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

ASML HOLDING NV

Lithographic apparatus and electrostatic clamp designs

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

EHM DIRK HEINRICH

Method for removing contamination on optical surfaces and optical arrangement

Particle cleaning of optical elements for microlithography

SJMAENOK LEONID AIZIKOVITCH

Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element

SWINKELS GERARDUS HUBERTUS PETRUS MARIA

Radiation source and lithographic apparatus

DONDERS SJOERD NICOLAAS LAMBERTUS

Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method

VAN MIERLO HUBERT ADRIAAN

Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus

MOORS JOHANNES HUBERTUS JOSEPHINA

Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor

VAN SCHOOT JAN BERNARD PLECHELMUS

Radiation source

YAKUNIN ANDREI MIKHAILOVICH

Radiation source, lithographic apparatus, and device manufacturing method

VAN EMPEL TJARKO ADRIAAN RUDOLF

Module and method for producing extreme ultraviolet radiation

ZEISS CARL SMT AG

Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements

LABETSKI DZMITRY

Source module, radiation source and lithographic apparatus