Inventor

STEVENS LUCAS HENRICUS JOHANNES

NL18 patents

⚠️ This page may combine multiple inventors who share the name “STEVENS LUCAS HENRICUS JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

STEVENS LUCAS HENRICUS JOHANNES

ASML NETHERLANDS BV

Pellicle for reticle and multilayer mirror

Pellicle for reticle and multilayer mirror

Radiation source, lithographic apparatus and device manufacturing method

Graphene spectral purity filter

System and method for detecting at least one contamination species in a lithographic apparatus

Lithographic apparatus, and device manufacturing method

Lithographic apparatus and a device manufacturing method

System, a lithographic apparatus, and a method for reducing oxidation or removing oxide on a substrate support

Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method

Lithographic apparatus and a device manufacturing method

Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate

BANINE VADIM YEVGENYEVICH

System and method for detecting at least one contamination species in a lithographic apparatus

System and method for detecting at least one contamination species in a lithographic apparatus

YAKUNIN ANDREI MIKHAILOVICH

Lithographic apparatus and method

DONDERS SJOERD NICOLAAS LAMBERTUS

Lithographic apparatus and device manufacturing method

DE JAGER PIETER WILLEM HERMAN

Lithographic apparatus, programmable patterning device and lithographic method

STEVENS LUCAS HENRICUS JOHANNES

Inspection apparatus and method

BRUINSMA ANASTASIUS JACOBUS ANICETUS

Lithographic apparatus and contamination detection method