Inventor

WOLSCHRIJN BASTIAAN THEODOOR

NL19 patents

⚠️ This page may combine multiple inventors who share the name “WOLSCHRIJN BASTIAAN THEODOOR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WOLSCHRIJN BASTIAAN THEODOOR

ASML NETHERLANDS BV

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus having a monitoring device for detecting contamination

Radical cleaning arrangement for a lithographic apparatus

Lithographic device, device manufacturing method and device manufactured thereby

Cleaning method, apparatus and cleaning system

Optical apparatus, lithographic apparatus and device manufacturing method

Lithographic apparatus, and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus, and device manufacturing method

Lithographic apparatus, system and device manufacturing method

ZEISS CARL SMT GMBH

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

Method for removing a contamination layer from an optical surface and arrangement therefor

EHM DIRK HEINRICH

Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor

Method for removing contamination on optical surfaces and optical arrangement

MOORS JOHANNES HUBERTUS JOSEPHINA

Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor

WOLSCHRIJN BASTIAAN THEODOOR

Optical element with at least one electrically conductive region, and illumination system with the optical element

ZEISS CARL SMT AG

Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements