Inventor
ZHANG SHOUBIN
JP14 patents
⚠️ This page may combine multiple inventors who share the name “ZHANG SHOUBIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZHANG SHOUBIN
8 patentsUS8968491B2Mar 3, 2015
Sputtering target and method for producing same
ZHANG SHOUBIN6 citations82
US8795489B2Aug 5, 2014
Sputtering target and method for producing the same
ZHANG SHOUBIN11 citations82
US9660127B2May 23, 2017
Sputtering target and method for producing same
ZHANG SHOUBIN3 citations71
US8466077B2Jun 18, 2013
Sputtering target for forming ZrO2-In2O3 based protective film for optical storage medium
ZHANG SHOUBIN2 citations60
US8268141B2Sep 18, 2012
High-strength sputtering target for forming protective film for optical recording medium
ZHANG SHOUBIN3 citations60
US8105467B2Jan 31, 2012
High strength sputtering target for forming phosphor film in electroluminescence element
ZHANG SHOUBIN2 citations60
US9528181B2Dec 27, 2016
Sputtering target and method for producing same
ZHANG SHOUBIN0 citations51
US9988710B2Jun 5, 2018
Sputtering target and method for producing same
ZHANG SHOUBIN0 citations48
MITSUBISHI MATERIALS CORP
5 patentsUS7351498B2Apr 1, 2008
Lithium ion polymer secondary battery its electrode and method for synthesizing polymer compound in binder used in adhesion layer thereof
MITSUBISHI MATERIALS CORP21 citations89
US9607812B2Mar 28, 2017
Sputtering target and method for producing same
MITSUBISHI MATERIALS CORP2 citations70
US10883169B2Jan 5, 2021
Sputtering target and method for producing sputtering target
MITSUBISHI MATERIALS CORP0 citations53
US9934949B2Apr 3, 2018
Sputtering target and production method of the same
MITSUBISHI MATERIALS CORP0 citations49
US10283332B2May 7, 2019
Cu—Ga binary alloy sputtering target and method of producing the same
MITSUBISHI MATERIALS CORP0 citations48