Inventor
CLAUSS WILFRIED
DE16 patents
⚠️ This page may combine multiple inventors who share the name “CLAUSS WILFRIED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
5 patentsUS8870396B2Oct 28, 2014
Substrates for mirrors for EUV lithography and their production
ZEISS CARL SMT GMBH5 citations72
US8031326B2Oct 4, 2011
Illumination system or projection lens of a microlithographic exposure system
ZEISS CARL SMT GMBH3 citations62
US7982969B2Jul 19, 2011
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations52
US9459538B2Oct 4, 2016
Lithography apparatus and method for producing a mirror arrangement
ZEISS CARL SMT GMBH0 citations50
US9238590B2Jan 19, 2016
Mirror elements for EUV lithography and production methods therefor
ZEISS CARL SMT GMBH0 citations50
CLAUSS WILFRIED
4 patentsUS9263161B2Feb 16, 2016
Optical arrangement for EUV lithography and method for configuring such an optical arrangement
CLAUSS WILFRIED2 citations59
US8711332B2Apr 29, 2014
Mirror elements for EUV lithography and production methods therefor
CLAUSS WILFRIED0 citations48
US8570488B2Oct 29, 2013
Transmitting optical element and objective for a microlithographic projection exposure apparatus
CLAUSS WILFRIED0 citations48
US8163667B2Apr 24, 2012
Transmitting optical element with low foreign-element contamination
CLAUSS WILFRIED1 citations48
ZEISS CARL SMT AG
3 patentsUS7907347B2Mar 15, 2011
Optical composite material and method for its production
ZEISS CARL SMT AG2 citations61
US7679721B2Mar 16, 2010
Projection objective of a microlithographic projection exposure apparatus and method for its production
ZEISS CARL SMT AG2 citations61
US7755839B2Jul 13, 2010
Microlithography projection objective with crystal lens
ZEISS CARL SMT AG0 citations51