Inventor

OH MYOUNG-HWAN

KR37 patents

⚠️ This page may combine multiple inventors who share the name “OH MYOUNG-HWAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OH MYOUNG-HWAN

LG CHEMICAL LTD

Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry

Cerium oxide powder, method for preparing the same, and CMP slurry comprising the same

Method for preparing cerium carbonate powder

Method for preparing lithium iron phosphate nanopowder

Washing machine having moisture absorption element

Method for preparing nickel oxide nanoparticles and nickel oxide nanoparticles produced by using the same

Method for preparing cerium oxide, cerium oxide prepared therefrom and CMP slurry comprising the same

Method for preparing lithium iron phosphate nanopowder

Method for preparing lithium iron phosphate nanopowder coated with carbon

Method for preparing lithium iron phosphate nanopowder

Method for preparing lithium iron phosphate nanopowder coated with carbon

Method for preparing lithium iron phosphate nanopowder

Method for preparing lithium iron phosphate nanopowder coated with carbon

Method for preparing lithium iron phosphate nanopowder

Method for preparing lithium iron phosphate nanopowder

Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same

Cerium oxide powder and process for producing the same

Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same

CMP slurry and method for polishing semiconductor wafer using the same

Cerium carbonate powder, cerium oxide powder, method for preparing the same, and CMP slurry comprising the same

Positive electrode active material by solid phase synthesis and method for manufacturing the same

SAMSUNG ELECTRONICS CO LTD

Highly integrated semiconductor device with silicide layer that secures contact margin and method of manufacturing the same

Silicon on insulator device having trench isolation layer and method for manufacturing the same

Semiconductor device and method of fabricating the same

Highly integrated semiconductor device with silicide layer that secures contact margin and method of manufacturing the same

Methods of fabricating semiconductor devices

Silicon on insulator device having trench isolation layer and method for manufacturing the same

Method of fabricating MOS transistor having fully silicided gate

OH MYOUNG-HWAN

Cerium oxide powder for abrasive and CMP slurry comprising the same

Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same

Method for preparing cerium carbonate powder using urea

NHO JUN-SEOK

Method for preparing cerium oxide powder using organic solvent and CMP slurry comprising the same

Cerium oxide powder, method for preparing the same, and CMP slurry comprising the same

HYEON TAEGHWAN

Surface-modified tantalum oxide nanoparticles, preparation method thereof, and contrast medium for X-ray computed tomography and highly dielectric thin film using same

LG ENERGY SOLUTION LTD

Tube module and tube assembly including same

SAMSNUNG ELECTRONICS CO LTD

Alignment mark and method for manufacturing a semiconductor device having the same

CHOI SANG-SOON

Method for preparing cerium carbonate