Inventor
HORITA Akinobu
JP9 patents
Patents
9 patentsUS10689573B2Jun 23, 2020
Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same
MITSUBISHI GAS CHEMICAL CO1 citations61
US10508173B2Dec 17, 2019
Composition for optical material and optical material using the same
MITSUBISHI GAS CHEMICAL CO1 citations60
US11479744B2Oct 25, 2022
Composition having suppressed alumina damage and production method for semiconductor substrate using same
MITSUBISHI GAS CHEMICAL CO0 citations59
US11352593B2Jun 7, 2022
Aqueous composition and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations59
US12338381B2Jun 24, 2025
Protective fluid for alumina, protection method, and production method for semiconductor substrate having alumina layer using same
MITSUBISHI GAS CHEMICAL CO0 citations57
US11193094B2Dec 7, 2021
Liquid composition for reducing damage of cobalt, alumina, interlayer insulating film and silicon nitride, and washing method using same
MITSUBISHI GAS CHEMICAL CO0 citations57
US9658365B2May 23, 2017
Optical material composition and method for producing same
MITSUBISHI GAS CHEMICAL CO0 citations49
US11629315B2Apr 18, 2023
Aqueous composition and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations48
US11613720B2Mar 28, 2023
Aqueous composition and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations48