Inventor

IWATO KAORU

JP50 patents

⚠️ This page may combine multiple inventors who share the name “IWATO KAORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IWATO KAORU

FUJIFILM CORP

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

Positive resist composition and pattern forming method using the same

Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device

Method of forming pattern and developer for use in the method

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition

Pattern forming method, chemical amplification resist composition and resist film

Resin composition and pattern forming method using the same

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Positive resist composition and pattern forming method using the same

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

Method of forming pattern and developer for use in the method

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device

Pattern forming method, chemical amplification resist composition and resist film

Pattern forming method, chemical amplification resist composition and resist film

Polymerizable compound and polymer compound obtained by using the same

Positive resist composition and pattern formation method using the positive resist composition

Positive photosensitive composition and a pattern-forming method using the same

Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device

Positive resist composition and pattern formation method using the positive resist composition

Positive resist composition and pattern formation method using the positive resist composition

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device

Negative pattern forming method and resist pattern

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

IWATO KAORU

Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device

Pattern forming method and actinic-ray- or radiation-sensitive resin composition

Pattern forming method, chemical amplification resist composition and resist film

Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same

Resist composition and method of forming pattern therewith

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same

Pattern forming method and resist composition

Pattern forming method, pattern, chemical amplification resist composition and resist film

FUJI PHOTO FILM CO LTD

Planographic printing plate precursor

Image forming material

Image forming material and ammonium compound

ENOMOTO YUICHIRO

Pattern forming method, chemical amplification resist composition and resist film

Method of forming pattern and developer for use in the method

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

HIRANO SHUJI

Polymerizable compound and polymer compound obtained by using the same

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

SAEGUSA HIROSHI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

KATO KEITA

Pattern forming method and resist composition

Method of forming pattern

KATAOKA SHOHEI

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same

YOSHIDOME MASAHIRO

Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition

KODAMA KUNIHIKO

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

KATO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

SUGIYAMA SHINICHI

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition