P

Inventor

LEE SANG DO

KR43 patents
⚠️ This page may combine multiple inventors who share the name “LEE SANG DO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DNF CO LTD

11 patents
US9245740B2Jan 26, 2016

Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

DNF CO LTD18 citations83
US9809608B2Nov 7, 2017

Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same

DNF CO LTD4 citations72
US9586979B2Mar 7, 2017

Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

DNF CO LTD3 citations72
US10202407B2Feb 12, 2019

Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same

DNF CO LTD1 citations62
US12518963B2Jan 6, 2026

Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same

DNF CO LTD0 citations61
US11749522B2Sep 5, 2023

Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same

DNF CO LTD0 citations61
US11393676B2Jul 19, 2022

Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same

DNF CO LTD0 citations61
US11358974B2Jun 14, 2022

Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition

DNF CO LTD0 citations61
US11319333B2May 3, 2022

Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same

DNF CO LTD0 citations60
US10894799B2Jan 19, 2021

Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same

DNF CO LTD1 citations60
US9916974B2Mar 13, 2018

Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition

DNF CO LTD1 citations51

SAMSUNG ELECTRONICS CO LTD

7 patents

SK HYNIX INC

7 patents

LEE SANG-DO

2 patents

JUSUNG ENG CO LTD

2 patents

HYNIX SEMICONDUCTOR INC

2 patents

SAMSUNG CORNING PREC MAT CO

2 patents

HA JI HYE

1 patent

DO LIM IND CO LTD

1 patent

HYUNDAI ELECTRONICS IND

1 patent

SAMSUNG CORNING PREC MAT CO LTD

1 patent

SHIHAN DIAMOND IND CO LTD

1 patent

HONG WAN TAEK

1 patent

KIM TAE-HYUNG

1 patent

KONG DONG-KEON

1 patent

YANG JIN-HO

1 patent

MOON SANG JUN

1 patent