Inventor

SWAMINATHAN SHANKAR

US94 patents

⚠️ This page may combine multiple inventors who share the name “SWAMINATHAN SHANKAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SWAMINATHAN SHANKAR

LAM RES CORP

Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors

Gapfill of variable aspect ratio features with a composite PEALD and PECVD method

Plasma assisted atomic layer deposition of multi-layer films for patterning applications

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

Sub-saturated atomic layer deposition and conformal film deposition

Gapfill of variable aspect ratio features with a composite PEALD and PECVD method

High dry etch rate materials for semiconductor patterning applications

Plasma assisted atomic layer deposition metal oxide for patterning applications

Gapfill of variable aspect ratio features with a composite PEALD and PECVD method

Plasma assisted atomic layer deposition titanium oxide for patterning applications

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors

High growth rate process for conformal aluminum nitride

Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edge

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors

Gapfill of variable aspect ratio features with a composite PEALD and PECVD method

Low volume showerhead with porous baffle

Doped ALD films for semiconductor patterning applications

Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system

Method for high modulus ALD SiO2 spacer

Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Low volume showerhead with faceplate holes for improved flow uniformity

Fill on demand ampoule refill

Collar, conical showerheads and/or top plates for reducing recirculation in a substrate processing system

Gapfill of variable aspect ratio features with a composite PEALD and PECVD method

Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors

Systems and methods for UV-based suppression of plasma instability

NOVELLUS SYSTEMS INC

Methods for depositing films on sensitive substrates

Soft landing nanolaminates for advanced patterning

Methods for depositing films on sensitive substrates

Plasma activated conformal dielectric film deposition

Methods for depositing films on sensitive substrates

Plasma activated conformal dielectric film deposition

Plasma activated conformal dielectric film deposition

Conformal film deposition for gapfill

Plasma activated conformal film deposition

Methods for depositing films on sensitive substrates

Soft landing nanolaminates for advanced patterning

ASM IP HOLDING BV

Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures

Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film

Vapor deposition of films comprising molybdenum

Apparatus and methods for performing an in-situ etch of reaction chambers with fluorine-based radicals

Semiconductor processing device

Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures

SWAMINATHAN SHANKAR

Conformal doping via plasma activated atomic layer deposition and conformal film deposition

Plasma activated conformal dielectric film deposition

LAVOIE ADRIEN

Plasma activated conformal film deposition

BRISTOL MYERS SQUIBB CO

Process for the preparation of epothilone analogs