Inventor

LIN HSIEN-HSIN

TW38 patents

⚠️ This page may combine multiple inventors who share the name “LIN HSIEN-HSIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN HSIEN-HSIN

TAIWAN SEMICONDUCTOR MFG

Method for fabricating a FinFET device

Controlling the shape of source/drain regions in FinFETs

Controlling the shape of source/drain regions in FinFETs

SiGe selective growth without a hard mask

Silicon layer for stopping dislocation propagation

Method of fabricating epitaxial structures

Silicon layer for stopping dislocation propagation

Method for improving selectivity of epi process

Method of forming strained structures with compound profiles in semiconductor devices

Method for incorporating impurity element in EPI silicon process

High performance strained source-drain structure and method of fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD

Controlling the shape of source/drain regions in FinFETs

Method of forming devices with strained source/drain structures

Devices with strained source/drain structures and method of forming the same

Dual epitaxial process for a finFET device

Devices with strained source/drain structures

Methods for manufacturing devices with source/drain structures

Method of fabricating an integrated circuit device

MEDIATEK INC

Semiconductor device method for forming the same

Method of manufacturing heat dissipation substrate with high thermal conductivity for semiconductor device

Semiconductor device and method of forming the same

Semiconductor structure and method for forming the same

Self-aligned contact and method for forming the same

Thermal via arrangement for multi-channel semiconductor device

SU CHIEN-CHANG

Epitaxy profile engineering for FinFETs

Epitaxy profile engineering for FinFETs

Method for incorporating impurity element in EPI silicon process

KWOK TSZ-MEI

Semiconductor devices with strained source/drain structures

Method of manufacturing strained source/drain structures

LIN HSIEN-HSIN

Method of fabricating a FinFET device

CHEN HUNG-KAI

Dual epitaxial process for a finFET device

CHEN KUAN-YU

Method for improving selectivity of epi process

YEH MING-HSI

Method of fabricating an integrated circuit device

CHENG CHUN-FAI

Transistors having a composite strain structure, integrated circuits, and fabrication methods thereof

LAI KAO-TING

Device with self aligned stressor and method of making same

SUNG HSUEH-CHANG

High performance strained source-drain structure and method of fabricating the same

HSU YU-RUNG

Method of fabricating strained structure in semiconductor device

WU CHII-MING

Source/drain formation and structure