Inventor
KOIKE KESAHIRO
JP7 patents
Patents
7 patentsUS6127068AOct 3, 2000
X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide film
HOYA CORP18 citations92
US7455785B2Nov 25, 2008
Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
HOYA CORP24 citations89
US6951502B2Oct 4, 2005
Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
HOYA CORP30 citations89
US7413832B2Aug 19, 2008
Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask
HOYA CORP17 citations87
US7691279B2Apr 6, 2010
Method of producing a glass substrate for a mask blank and method of producing a mask blank
HOYA CORP12 citations82
US7732101B2Jun 8, 2010
Method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grains
HOYA CORP7 citations68
US7635544B2Dec 22, 2009
Transparent substrate for mask blank and mask blank
HOYA CORP0 citations51