Inventor

POSSEME NICOLAS

FR84 patents

⚠️ This page may combine multiple inventors who share the name “POSSEME NICOLAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

POSSEME NICOLAS

COMMISSARIAT ENERGIE ATOMIQUE

Microelectronic method for etching a layer

Method of forming spacers for a gate of a transistor

Plasma etching process

Method of making an individualization zone of an integrated circuit

Method for forming spacers for a transistor gate

Method for isotropic etching

Method of etching a three-dimensional dielectric layer

Method for fabricating a nanowire semiconductor transistor having an auto-aligned gate and spacers

Method for producing patterns in a substrate

Method for forming spacers for a transistor gate

Production of spacers at flanks of a transistor gate

Method for forming spacers for a transitor gate

Method of manufacturing microelectronic components

Method for fabricating an integrated circuit including a NMOS transistor and a PMOS transistor

Fabrication of transistors having stressed channels

Transistor with reduced parasitic capacitance and access resistance of the source and drain, and method of fabrication of the same

Method to prepare semi-conductor device comprising a selective etching of a silicium—germanium layer

Method of making a quantum device

Formation of reliefs on the surface of a substrate

Method for forming a functionalised guide pattern for a graphoepitaxy method

Method for forming a functionalised guide pattern for a graphoepitaxy method

Method for increasing the surface roughness of a metal layer

Method for increasing the surface roughness of a metal layer

Process for manufacturing assembly pads on a carrier for the self-assembly of an electronic circuit on the carrier

Method for producing on the same transistors substrate having different characteristics

Method for activating an exposed layer

Method for etching a three-dimensional dielectric layer

Device comprising spacers including a localised airgap and associated manufacturing methods

Method for forming trenches

Method for producing a component by filling a cavity within an electrical isolation area with carbon-based material

Method for manufacturing microelectronic components

Method of manufacturing a transistor with a raised source and drain

Method of producing microelectronic components

Selective etching process of a mask disposed on a silicon substrate

Method of forming spacers for a gate of a transistor

Method for forming spacers for a transistor gate

Semiconductor device and associated manufacturing method

Method for producing at least one device in compressive strained semiconductor

Method for manufacturing an electronic component having multiple quantum dots

Method for the directed self-assembly of a block copolymer by graphoepitaxy

Quantum device and method for producing the same

Method for manufacturing a mould for nanoprinting and associated mould

Method of making an individualization zone of an integrated circuit

APPLIED MATERIALS INC

Methods of forming silicon nitride spacers

Embedded test structure for trimming process control

COMMISSARIAT A LENERGIE ATOMIQUE ET AUX ENE ALT

Method of etching a porous dielectric material

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT

Method for forming spacers for a transistor gate

COMISSARIAT A LENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Process for etching a SiN-based layer

Commissariat à l'Energie Atomique et aux Energies Alternatives

Protection method for protecting a silicide layer

VINET MAUD

Method for fabricating a field effect device with weak junction capacitance