Inventor
MUELLER BRIAN L
US35 patents
⚠️ This page may combine multiple inventors who share the name “MUELLER BRIAN L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
15 patentsUS6177026B1Jan 23, 2001
CMP slurry containing a solid catalyst
CABOT MICROELECTRONICS CORP111 citations98
US6293848B1Sep 25, 2001
Composition and method for planarizing surfaces
CABOT MICROELECTRONICS CORP86 citations97
US6435947B2Aug 20, 2002
CMP polishing pad including a solid catalyst
CABOT MICROELECTRONICS CORP55 citations96
US6383065B1May 7, 2002
Catalytic reactive pad for metal CMP
CABOT MICROELECTRONICS CORP51 citations96
US6689692B1Feb 10, 2004
Composition for oxide CMP
CABOT MICROELECTRONICS CORP56 citations95
US6362104B1Mar 26, 2002
Method for polishing a substrate using a CMP slurry
CABOT MICROELECTRONICS CORP42 citations93
US6984588B2Jan 10, 2006
Compositions for oxide CMP
CABOT MICROELECTRONICS CORP21 citations92
US6527817B1Mar 4, 2003
Composition and method for planarizing surfaces
CABOT MICROELECTRONICS CORP25 citations92
US6533832B2Mar 18, 2003
Chemical mechanical polishing slurry and method for using same
CABOT MICROELECTRONICS CORP48 citations91
US6726534B1Apr 27, 2004
Preequilibrium polishing method and system
CABOT MICROELECTRONICS CORP39 citations89
US6350393B2Feb 26, 2002
Use of CsOH in a dielectric CMP slurry
CABOT MICROELECTRONICS CORP16 citations80
US6716755B2Apr 6, 2004
Composition and method for planarizing surfaces
CABOT MICROELECTRONICS CORP11 citations73
US6612911B2Sep 2, 2003
Alkali metal-containing polishing system and method
CABOT MICROELECTRONICS CORP11 citations71
US7238618B2Jul 3, 2007
System for the preferential removal of silicon oxide
CABOT MICROELECTRONICS CORP9 citations70
US7365013B2Apr 29, 2008
System for the preferential removal of silicon oxide
CABOT MICROELECTRONICS CORP0 citations48
CABOT CORP
8 patentsUS6068787AMay 30, 2000
Composition and slurry useful for metal CMP
CABOT CORP189 citations99
US5980775ANov 9, 1999
Composition and slurry useful for metal CMP
CABOT CORP144 citations99
US5958288ASep 28, 1999
Composition and slurry useful for metal CMP
CABOT CORP219 citations99
US6015506AJan 18, 2000
Composition and method for polishing rigid disks
CABOT CORP127 citations98
US5858813AJan 12, 1999
Chemical mechanical polishing slurry for metal layers and films
CABOT CORP320 citations98
US5759917AJun 2, 1998
Composition for oxide CMP
CABOT CORP245 citations97
US5993686ANov 30, 1999
Fluoride additive containing chemical mechanical polishing slurry and method for use of same
CABOT CORP136 citations95
US6319096B1Nov 20, 2001
Composition and method for planarizing surfaces
CABOT CORP32 citations92
SPEEDFAM IPEC CORP
3 patentsUS6736952B2May 18, 2004
Method and apparatus for electrochemical planarization of a workpiece
SPEEDFAM IPEC CORP155 citations98
US6974525B2Dec 13, 2005
Method and apparatus for electrochemical planarization of a workpiece
SPEEDFAM IPEC CORP7 citations73
US6849547B2Feb 1, 2005
Apparatus and process for polishing a workpiece
SPEEDFAM IPEC CORP1 citations52
ECOLAB USA INC
3 patentsUS9404033B2Aug 2, 2016
Environmentally beneficial recycling of brines in the process of reducing friction resulting from turbulent flow
ECOLAB USA INC4 citations65
US10400157B2Sep 3, 2019
Surfactant assisted oil recovery using alcohol ether sulfonates and cationic surfactants
ECOLAB USA INC0 citations52
US9926486B2Mar 27, 2018
Surfactant assisted oil recovery using alcohol ether sulfonates and cationic surfactants
ECOLAB USA INC0 citations52
UNIV MICHIGAN
2 patentsROHM & HAAS ELECT MAT
2 patentsUS7297633B1Nov 20, 2007
Compositions for chemical mechanical polishing silica and silicon nitride having improved endpoint detection
ROHM & HAAS ELECT MAT3 citations63
US7291280B2Nov 6, 2007
Multi-step methods for chemical mechanical polishing silicon dioxide and silicon nitride
ROHM & HAAS ELECT MAT3 citations60