Inventor · disambiguated record
Shan Clark
Also filed as: CLARK SHAN · CLARK SHAN C · CLARK SHAN CHRISTOPHER
13 granted patents·7 pending applications·311 citations·filing 1997–2008
93Inventor score
Top patents by PatentIndex Score
20 records- 0195US7275817B2Formation of novel ink jet filter printhead using transferable photopatterned filter layerXEROX CORP·Filed 2005·Granted Oct 2, 2007·25 cites·4 claims
- 0294US6409316B1Thermal ink jet printhead with crosslinked polymer layerXEROX CORP·Filed 2000·Granted Jun 25, 2002·56 cites·33 claims
- 0393US6034150APolymerization processes using aliphatic maleimidesUNIV SOUTHERN MISSISSIPPI·Filed 1997·Granted Mar 7, 2000·62 cites·14 claims
- 0492US6855745B2Polymerization processes using aliphatic maleimidesALBEMARLE CORP·Filed 2001·Granted Feb 15, 2005·29 cites·84 claims
- 0591US7241707B2Layered films formed by controlled phase segregationINTEL CORP·Filed 2005·Granted Jul 10, 2007·22 cites·44 claims
- 0691US6369124B1Polymerization processes using aliphatic maleimidesFIRST CHEMICAL CORP·Filed 1999·Granted Apr 9, 2002·47 cites·18 claims
- 0780US7101030B2Formation of novel ink jet filter printhead using transferable photopatterned filter layerXEROX CORP·Filed 2003·Granted Sep 5, 2006·18 cites·5 claims
- 0870US7241560B2Basic quencher/developer solutions for photoresistsINTEL CORP·Filed 2005·Granted Jul 10, 2007·3 cites·9 claims
- 0970US6555593B1Photopolymerization compositions including maleimides and processes for using the sameALBEMARLE CORP·Filed 1999·Granted Apr 29, 2003·32 cites·64 claims
- 1068US7442675B2Cleaning composition and method of cleaning semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Oct 28, 2008·12 cites·6 claims
- 1155US8017568B2Cleaning residues from semiconductor structuresINTEL CORP·Filed 2003·Granted Sep 13, 2011·1 cites·4 claims
- 1246US7361455B2Anti-reflective coatingsINTEL CORP·Filed 2004·Granted Apr 22, 2008·1 cites·3 claims
- 1346US6982022B2Formation of photopatterned ink jet nozzle plates by transfer methodsXEROX CORP·Filed 2003·Granted Jan 3, 2006·3 cites·9 claims
- 1445US2009241988A1Photoresist and antireflective layer removal solution and method thereofINTEL CORP·Filed 2008·Application pending·0 cites
- 1543US2004235976A1Polymerization processes using alphatic maleimidesFiled 2004·Application pending·0 cites
- 1639US2004265734A1Photoresist performance through control of polymer characteristicsFiled 2003·Application pending·0 cites
- 1737US2004079388A1Removing fluorine-based plasma etch residuesFiled 2002·Application pending·0 cites
- 1837US2005084807A1Reducing photoresist line edge roughness using chemically-assisted reflowFiled 2003·Application pending·0 cites
- 1936US2006102204A1Method for removing a residue from a substrate using supercritical carbon dioxide processingINTEL CORP·Filed 2004·Application pending·0 cites
- 2034US2006003271A1Basic supercritical solutions for quenching and developing photoresistsCLARK SHAN C·Filed 2004·Application pending·0 cites
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