Inventor
AMENT IRENE
DE6 patents
Patents
6 patentsUS10649340B2May 12, 2020
Reflective optical element for EUV lithography
ZEISS CARL SMT GMBH1 citations59
US11256182B2Feb 22, 2022
Process for cleaning optical elements for the ultraviolet wavelength range
ZEISS CARL SMT GMBH0 citations58
US10690812B2Jun 23, 2020
Optical element and optical system for EUV lithography, and method for treating such an optical element
ZEISS CARL SMT GMBH1 citations55
US10061205B2Aug 28, 2018
Reflective optical element
ZEISS CARL SMT GMBH1 citations49
US10712677B2Jul 14, 2020
Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
ZEISS CARL SMT GMBH0 citations48
US10627217B2Apr 21, 2020
Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system
ZEISS CARL SMT GMBH0 citations37