Inventor

EHM DIRK HEINRICH

DE38 patents

⚠️ This page may combine multiple inventors who share the name “EHM DIRK HEINRICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EHM DIRK HEINRICH

ZEISS CARL SMT GMBH

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical assembly with a protective element and optical arrangement therewith

Reflective optical element and optical system for EUV lithography

Optical assembly with suppression of degradation

EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method

EUV lithography system and operating method

EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface

Reflective optical element for EUV lithography

Method for removing a contamination layer by an atomic layer etching process

Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography

Optical element and optical system for EUV lithography, and method for treating such an optical element

Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

Method for operating an EUV lithography apparatus, and EUV lithography apparatus

Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus

Reflective optical element

Method for removing a contamination layer from an optical surface and arrangement therefor

Optical system for EUV lithography with a charged-particle source

Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

EUV lithography apparatus and method for detecting particles in an EUV lithography apparatus

Method for correcting the surface form of a mirror

EHM DIRK HEINRICH

Optical arrangement, in particular in a projection exposure apparatus for EUV lithography

Protection module for EUV lithography apparatus, and EUV lithography apparatus

Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor

Method for removing contamination on optical surfaces and optical arrangement

Particle cleaning of optical elements for microlithography

Surface correction on coated mirrors

Arrangement for use in a projection exposure tool for microlithography having a reflective optical element

ZEISS CARL SMT AG

Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device

Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements

KRAUS DIETER

Detection of contaminating substances in an EUV lithography apparatus

MOORS JOHANNES HUBERTUS JOSEPHINA

Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor

ASML NETHERLANDS BV

Cleaning method, apparatus and cleaning system

SINGER WOLFGANG

EUV lithography device and method for processing an optical element

HEMBACHER STEFAN

Cleaning module, EUV lithography device and method for the cleaning thereof

WOLSCHRIJN BASTIAAN THEODOOR

Optical element with at least one electrically conductive region, and illumination system with the optical element

LOERING ULRICH

Projection objective of a microlithographic projection exposure apparatus

WALDIS SEVERIN

Mirror for guiding a radiation bundle