Inventor
BECKER MORITZ
DE15 patents
⚠️ This page may combine multiple inventors who share the name “BECKER MORITZ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
9 patentsUS10649340B2May 12, 2020
Reflective optical element for EUV lithography
ZEISS CARL SMT GMBH1 citations59
US11199363B2Dec 14, 2021
Method for removing a contamination layer by an atomic layer etching process
ZEISS CARL SMT GMBH1 citations57
US12306551B2May 20, 2025
Projection exposure apparatus having a device for determining the concentration of atomic hydrogen
ZEISS CARL SMT GMBH0 citations56
US12287588B2Apr 29, 2025
Method for operating an EUV lithography apparatus, and EUV lithography apparatus
ZEISS CARL SMT GMBH0 citations51
US11307505B2Apr 19, 2022
Method for operating an optical apparatus, and optical apparatus
ZEISS CARL SMT GMBH0 citations50
US10061205B2Aug 28, 2018
Reflective optical element
ZEISS CARL SMT GMBH1 citations49
US10712677B2Jul 14, 2020
Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
ZEISS CARL SMT GMBH0 citations48
US11137687B2Oct 5, 2021
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
ZEISS CARL SMT GMBH0 citations46
US10627217B2Apr 21, 2020
Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system
ZEISS CARL SMT GMBH0 citations37