Inventor

URICH DIANA

DE2 patents

Patents

2 patents

US10649340B2May 12, 2020

Reflective optical element for EUV lithography

ZEISS CARL SMT GMBH1 citations59

US10712677B2Jul 14, 2020

Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

ZEISS CARL SMT GMBH0 citations48