P

Inventor

VAN OOSTEN ANTON BERNHARD

BE15 patents

Patents

15 patents
US11079687B2Aug 3, 2021

Process window based on defect probability

ASML NETHERLANDS BV11 citations83
US11150560B2Oct 19, 2021

Projection system and mirror and radiation source for a lithographic apparatus

ASML NETHERLANDS BV1 citations73
US10732511B2Aug 4, 2020

Projection system and mirror and radiation source for a lithographic apparatus

ASML NETHERLANDS BV1 citations73
US10216093B2Feb 26, 2019

Projection system and minor and radiation source for a lithographic apparatus

ASML NETHERLANDS BV1 citations73
US10054862B2Aug 21, 2018

Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method

ASML NETHERLANDS BV3 citations72
US10571812B2Feb 25, 2020

Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method

ASML NETHERLANDS BV2 citations66
US11460782B2Oct 4, 2022

Matching pupil determination

ASML NETHERLANDS BV1 citations61
US11822255B2Nov 21, 2023

Process window based on defect probability

ASML NETHERLANDS BV0 citations60
US11314174B2Apr 26, 2022

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

ASML NETHERLANDS BV1 citations60
US11287748B2Mar 29, 2022

Guided patterning device inspection

ASML NETHERLANDS BV0 citations58
US10001710B2Jun 19, 2018

Inspection apparatus, inspection method, lithographic apparatus and manufacturing method

ASML NETHERLANDS BV0 citations51
US12112260B2Oct 8, 2024

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

ASML NETHERLANDS BV0 citations50
US10775705B2Sep 15, 2020

Patterning stack optimization

ASML NETHERLANDS BV0 citations49
US11054754B2Jul 6, 2021

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

ASML NETHERLANDS BV0 citations48
US9798225B2Oct 24, 2017

Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing method

ASML NETHERLANDS BV0 citations30