Inventor

MANKOS MARIAN

US51 patents

⚠️ This page may combine multiple inventors who share the name “MANKOS MARIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MANKOS MARIAN

KLA TENCOR TECH CORP

Maskless reflection electron beam projection lithography

Electrical process monitoring using mirror-mode electron microscopy

Method and apparatus for reducing substrate edge effects in electron lenses

Prism array for electron beam inspection and defect review

Method and apparatus for dual-energy e-beam inspector

Scanning electron microscope with curved axes

Dual-energy electron flooding for neutralization of charged substrate

Reflective electron patterning device and method of using same

Holey mirror arrangement for dual-energy e-beam inspector

Twisted-compensated low-energy electron microscope

Immersion objective lens for e-beam inspection

Photocathode source for e-beam inspection or review

High contrast inspection and review of magnetic media and heads

High-fidelity reflection electron beam lithography

Apparatus and method for tilted particle-beam illumination

Systems, control subsystems, and methods for projecting an electron beam onto a specimen

High contrast inspection and review of magnetic media and heads

High-resolution, low-distortion and high-efficiency optical coupling in detection system of electron beam apparatus

APPLIED MATERIALS INC

Multiple beam electron beam lithography system

Suppression of emission noise for microcolumn applications in electron beam inspection

Gated photocathode for controlled single and multiple electron beam emission

Patterned heat conducting photocathode for electron beam source

Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance

Multiple electron beam lithography system with multiple beam modulated laser illumination

Diamond supported photocathodes for electron sources

Moving photocathode with continuous regeneration for image conversion in electron beam lithography

Optical coupling to gated photocathodes

MANKOS MARIAN

Mirror monochromator for charged particle beam apparatus

Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination

Mirror energy filter for electron beam apparatus

Compact arrangement for dual-beam low energy electron microscope

Compact arrangement for aberration correction of electron lenses

Mirror pulse compressor for electron beam apparatus

Electron beam column and methods of using same

PDF SOLUTIONS INC

E-beam inspection apparatus and method of using the same on various integrated circuit chips

Systems, devices, and methods for performing a non-contact electrical measurement on a cell, non-contact electrical measurement cell vehicle, chip, wafer, die, or logic block

Systems, devices, and methods for performing a non-contact electrical measurement on a cell, non-contact electrical measurement cell vehicle, chip, wafer, die, or logic block

Systems, devices, and methods for performing a non-contact electrical measurement on a cell, non-contact electrical measurement cell vehicle, chip, wafer, die, or logic block

Methods for performing a non-contact electrical measurement on a cell, chip, wafer, die, or logic block

ETEC SYSTEMS INC

Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography

Charged particle beam illumination of blanking aperture array

Electrostatic alignment of a charged particle beam

Method of forming gated photocathode for controlled single and multiple electron beam emission

Shaped shadow projection for an electron beam column

KLA TENCOR CORP

Immersion gun equipped electron beam column

Electron beam apparatus and inspection method using dual illumination beams with dynamically controllable offsets

Shielding, particulate reducing high vacuum components

HAN LIQUN

High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture

FERNADEZ ANDRES

Electron beam lithography system having improved electron gun

UNIV LELAND STANFORD JUNIOR

Aberration reduction in multipass electron microscopy