Inventor
HUANG JU-LI
TW22 patents
Patents
22 patentsUS9761684B2Sep 12, 2017
Method and structure for metal gates
TAIWAN SEMICONDUCTOR MFG CO LTD26 citations93
US9431304B2Aug 30, 2016
Method and structure for metal gates
TAIWAN SEMICONDUCTOR MFG CO LTD28 citations93
US10490410B2Nov 26, 2019
Self-protective layer formed on high-K dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10283417B1May 7, 2019
Self-protective layer formed on high-k dielectric layers with different materials
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10170317B1Jan 1, 2019
Self-protective layer formed on high-k dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10361133B2Jul 23, 2019
High-K metal gate and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US10529629B2Jan 7, 2020
Methods of forming metal gates
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations70
US12376326B2Jul 29, 2025
Gate resistance improvement and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12362229B2Jul 15, 2025
Semiconductor device structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12027415B2Jul 2, 2024
Semiconductor device structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12015077B2Jun 18, 2024
Metal gate using monolayers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11923201B2Mar 5, 2024
Self-protective layer formed on high-K dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11810978B2Nov 7, 2023
Gate resistance improvement and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11476156B2Oct 18, 2022
Semiconductor device structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11257924B2Feb 22, 2022
Metal gate using monolayers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11114347B2Sep 7, 2021
Self-protective layer formed on high-k dielectric layers with different materials
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11031500B2Jun 8, 2021
Gate resistance improvement and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10937656B2Mar 2, 2021
Self-protective layer formed on high-k dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11031302B2Jun 8, 2021
High-k metal gate and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11295990B2Apr 5, 2022
Methods of forming metal gates
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10755970B2Aug 25, 2020
Semiconductor device structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10541317B2Jan 21, 2020
Method of forming a metal gate using monolayers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52