Inventor
CHOU CHIH-CHUNG
TW34 patents
⚠️ This page may combine multiple inventors who share the name “CHOU CHIH-CHUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
19 patentsUS11446711B2Sep 20, 2022
Steam treatment stations for chemical mechanical polishing system
APPLIED MATERIALS INC8 citations85
US11577358B2Feb 14, 2023
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
APPLIED MATERIALS INC4 citations74
US11633833B2Apr 25, 2023
Use of steam for pre-heating of CMP components
APPLIED MATERIALS INC3 citations72
US12296427B2May 13, 2025
Apparatus and method for CMP temperature control
APPLIED MATERIALS INC1 citations64
US12528151B2Jan 20, 2026
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
APPLIED MATERIALS INC0 citations62
US12459011B2Nov 4, 2025
Steam treatment stations for chemical mechanical polishing system
APPLIED MATERIALS INC0 citations62
US12434347B2Oct 7, 2025
Method for CMP temperature control
APPLIED MATERIALS INC0 citations62
US12030093B2Jul 9, 2024
Steam treatment stations for chemical mechanical polishing system
APPLIED MATERIALS INC0 citations62
US11865671B2Jan 9, 2024
Temperature-based in-situ edge assymetry correction during CMP
APPLIED MATERIALS INC0 citations62
US11701749B2Jul 18, 2023
Monitoring of vibrations during chemical mechanical polishing
APPLIED MATERIALS INC1 citations62
US11628478B2Apr 18, 2023
Steam cleaning of CMP components
APPLIED MATERIALS INC0 citations62
US12459078B2Nov 4, 2025
In-situ conditioner disk cleaning during CMP
APPLIED MATERIALS INC0 citations61
US11660722B2May 30, 2023
Polishing system with capacitive shear sensor
APPLIED MATERIALS INC1 citations61
US12233505B2Feb 25, 2025
Polishing system with capacitive shear sensor
APPLIED MATERIALS INC0 citations60
US12148647B2Nov 19, 2024
Integrated substrate measurement system
APPLIED MATERIALS INC0 citations46
US11819976B2Nov 21, 2023
Spray system for slurry reduction during chemical mechanical polishing (cmp)
APPLIED MATERIALS INC0 citations46
US12533771B2Jan 27, 2026
Polishing slurry dispense nozzle
APPLIED MATERIALS INC0 citations44
US10610994B2Apr 7, 2020
Polishing system with local area rate control and oscillation mode
APPLIED MATERIALS INC0 citations41
US10434623B2Oct 8, 2019
Local area polishing system and polishing pad assemblies for a polishing system
APPLIED MATERIALS INC0 citations41
O2MICRO INC
4 patentsUS11699915B2Jul 11, 2023
Controller and battery management methods
O2MICRO INC5 citations82
US11211812B2Dec 28, 2021
Controller and battery management methods
O2MICRO INC8 citations80
US12081056B2Sep 3, 2024
Controller and battery management methods
O2MICRO INC1 citations69
US12055591B2Aug 6, 2024
Battery management controllers capable of determining estimate of state of charge
O2MICRO INC0 citations49