Inventor
TSAI FEI-GWO
TW31 patents
⚠️ This page may combine multiple inventors who share the name “TSAI FEI-GWO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
15 patentsUS7160654B2Jan 9, 2007
Method of the adjustable matching map system in lithography
TAIWAN SEMICONDUCTOR MFG17 citations92
US6361911B1Mar 26, 2002
Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure system
TAIWAN SEMICONDUCTOR MFG29 citations92
US6383693B1May 7, 2002
Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern
TAIWAN SEMICONDUCTOR MFG10 citations73
US7241541B2Jul 10, 2007
Method of the adjustable matching map system in lithography
TAIWAN SEMICONDUCTOR MFG2 citations62
US7043327B2May 9, 2006
Lithography apparatus and method employing non-environmental variable correction
TAIWAN SEMICONDUCTOR MFG6 citations61
US8007966B2Aug 30, 2011
Multiple technology node mask
TAIWAN SEMICONDUCTOR MFG2 citations60
US9081306B2Jul 14, 2015
Method of optimizing lithography tools utilization
TAIWAN SEMICONDUCTOR MFG2 citations58
US6841313B2Jan 11, 2005
Photomask with dies relating to different functionalities
TAIWAN SEMICONDUCTOR MFG6 citations54
US7871742B2Jan 18, 2011
Method for controlling phase angle of a mask by post-treatment
TAIWAN SEMICONDUCTOR MFG0 citations52
US7368229B2May 6, 2008
Composite layer method for minimizing PED effect
TAIWAN SEMICONDUCTOR MFG1 citations52
US7244533B2Jul 17, 2007
Method of the adjustable matching map system in lithography
TAIWAN SEMICONDUCTOR MFG0 citations52
US8003281B2Aug 23, 2011
Hybrid multi-layer mask
TAIWAN SEMICONDUCTOR MFG0 citations49
US7875406B2Jan 25, 2011
Multiple technology node mask
TAIWAN SEMICONDUCTOR MFG1 citations49
US7037628B2May 2, 2006
Method of a floating pattern loading system in mask dry-etching critical dimension control
TAIWAN SEMICONDUCTOR MFG1 citations45
US6799312B1Sep 28, 2004
Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer making
TAIWAN SEMICONDUCTOR MFG0 citations42
TAIWAN SEMICONDUCTOR MFG CO LTD
12 patentsUS9733568B2Aug 15, 2017
Tool and method of developing
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations82
US11003091B2May 11, 2021
Method of fabricating reticle
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10534272B2Jan 14, 2020
Method of fabricating reticle
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10073354B2Sep 11, 2018
Exposure method of wafer substrate, manufacturing method of semiconductor device, and exposure tool
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10627718B2Apr 21, 2020
Developing method
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US10101662B2Oct 16, 2018
Developing method
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US9466101B2Oct 11, 2016
Detection of defects on wafer during semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations65
US11940737B2Mar 26, 2024
Method of fabricating reticle
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11150558B2Oct 19, 2021
Developing method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12027407B2Jul 2, 2024
Substrate support apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9908201B2Mar 6, 2018
Systems and methods for edge bead removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9618855B2Apr 11, 2017
Lithography system and method for mask inspection
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations34