P

Inventor

MANISCALCO JOSEPH F

US31 patents

Patents

31 patents
US10529622B1Jan 7, 2020

Void-free metallic interconnect structures with self-formed diffusion barrier layers

IBM16 citations94
US6124074ASep 26, 2000

Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives

IBM29 citations92
US10049980B1Aug 14, 2018

Low resistance seed enhancement spacers for voidless interconnect structures

IBM7 citations84
US11758819B2Sep 12, 2023

Magneto-resistive random access memory with laterally-recessed free layer

IBM2 citations73
US11183455B2Nov 23, 2021

Interconnects with enlarged contact area

IBM2 citations73
US10950493B1Mar 16, 2021

Interconnects having air gap spacers

IBM2 citations73
US10741748B2Aug 11, 2020

Back end of line metallization structures

IBM2 citations73
US6562554B1May 13, 2003

Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives

IBM6 citations73
US12557555B2Feb 17, 2026

Magnetic tunnel junction with an etched bottom electrode having non-planar sidewalls

IBM0 citations62
US12538714B2Jan 27, 2026

Magneto-resistive random access memory with laterally-recessed free layer

IBM0 citations62
US12349597B2Jul 1, 2025

Conical magnetic random access memory pillar structures

IBM0 citations62
US12342726B2Jun 24, 2025

Etching of magnetic tunnel junction (MTJ) stack for magnetoresistive random-access memory (MRAM)

IBM0 citations62
US12167700B2Dec 10, 2024

Replacement bottom electrode structure for MRAM devices

IBM0 citations62
US12108685B2Oct 1, 2024

Multi-diameter magnetic random-access memory pillar structure

IBM0 citations62
US11682471B2Jun 20, 2023

Dual damascene crossbar array for disabling a defective resistive switching device in the array

IBM0 citations62
US11430690B2Aug 30, 2022

Interconnects having air gap spacers

IBM1 citations62
US10930589B2Feb 23, 2021

Advanced interconnects containing an IMT liner

IBM0 citations62
US10903116B2Jan 26, 2021

Void-free metallic interconnect structures with self-formed diffusion barrier layers

IBM0 citations62
US10686126B2Jun 16, 2020

Back end of line metallization structures

IBM1 citations62
US12040230B2Jul 16, 2024

Encapsulated top via interconnects

IBM0 citations61
US11664271B2May 30, 2023

Dual damascene with short liner

IBM0 citations61
US11177171B2Nov 16, 2021

Encapsulated top via interconnects

IBM0 citations61
US11069566B2Jul 20, 2021

Hybrid sidewall barrier facilitating low resistance interconnection

IBM1 citations58
US12317752B2May 27, 2025

MRAM structure with multilayer encapsulation

IBM0 citations52
US11380641B2Jul 5, 2022

Pillar bump with noble metal seed layer for advanced heterogeneous integration

IBM0 citations52
US10546815B2Jan 28, 2020

Low resistance interconnect structure with partial seed enhancement liner

IBM0 citations52
US10468346B2Nov 5, 2019

Advanced interconnects containing an IMT liner

IBM0 citations52
US10431542B2Oct 1, 2019

Low resistance seed enhancement spacers for voidless interconnect structures

IBM0 citations52
US11282768B2Mar 22, 2022

Fully-aligned top-via structures with top-via trim

IBM0 citations50
US11158538B2Oct 26, 2021

Interconnect structures with cobalt-infused ruthenium liner and a cobalt cap

IBM0 citations50
US10840325B2Nov 17, 2020

Low resistance metal-insulator-metal capacitor electrode

IBM0 citations42