P

Inventor

HATASE MASAKO

JP16 patents
⚠️ This page may combine multiple inventors who share the name “HATASE MASAKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADEKA CORP

15 patents
US12104245B2Oct 1, 2024

Compound, thin-film forming raw material that contains said compound, and method of manufacturing thin film

ADEKA CORP3 citations72
US11623935B2Apr 11, 2023

Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound

ADEKA CORP0 citations62
US12264168B2Apr 1, 2025

Ruthenium compound, thin-film forming raw material, and method of producing thin film

ADEKA CORP0 citations61
US12486573B2Dec 2, 2025

Thin-film forming raw material, thin-film and method of producing thin-film

ADEKA CORP0 citations59
US11760771B2Sep 19, 2023

Ruthenium compound, raw material for forming thin film, and method for producing thin film

ADEKA CORP0 citations59
US10351584B2Jul 16, 2019

Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound

ADEKA CORP0 citations51
US10167304B2Jan 1, 2019

Ruthenium compound, material for thin film formation, and process for thin film formation

ADEKA CORP0 citations51
US10155784B2Dec 18, 2018

Alcohol compound

ADEKA CORP0 citations51
US9896468B2Feb 20, 2018

Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compound

ADEKA CORP1 citations51
US10364495B2Jul 30, 2019

Method for producing a thin film

ADEKA CORP0 citations50
US9663538B2May 30, 2017

Aluminum compound, thin-film forming raw material, and method for producing thin film

ADEKA CORP1 citations50
US12577660B2Mar 17, 2026

Compound, thin-film forming raw material, thin-film, and method of producing thin-film

ADEKA CORP0 citations47
US12509764B2Dec 30, 2025

Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film

ADEKA CORP0 citations47
US12276022B2Apr 15, 2025

Alkoxide compound, thin-film forming raw material, and method of producing thin-film

ADEKA CORP0 citations47
US10011623B2Jul 3, 2018

Alkoxide compound, thin film-forming starting material, and thin film formation method

ADEKA CORP0 citations40

SAMSUNG ELECTRONICS CO LTD

1 patent