Inventor
ZHANG DUMING
US5 patents
Patents
5 patentsUS11211253B2Dec 28, 2021
Atomic layer deposition and etch in a single plasma chamber for critical dimension control
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US10734238B2Aug 4, 2020
Atomic layer deposition and etch in a single plasma chamber for critical dimension control
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US10950454B2Mar 16, 2021
Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method
LAM RES CORP2 citations72
US10658174B2May 19, 2020
Atomic layer deposition and etch for reducing roughness
LAM RES CORP3 citations68
US11170997B2Nov 9, 2021
Atomic layer deposition and etch for reducing roughness
LAM RES CORP0 citations57