Inventor
YOKOTA JIRO
JP3 patents
Patents
3 patentsUS10529581B2Jan 7, 2020
SiN selective etch to SiO2 with non-plasma dry process for 3D NAND device applications
AIR LIQUIDE9 citations82
US11075084B2Jul 27, 2021
Chemistries for etching multi-stacked layers
AIR LIQUIDE7 citations74
US12106940B2Oct 1, 2024
Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes
AIR LIQUIDE0 citations46