Inventor
WANG LEIJIE
CN19 patents
⚠️ This page may combine multiple inventors who share the name “WANG LEIJIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNIV TSINGHUA
13 patentsUS11307018B2Apr 19, 2022
Two-degree-of-freedom heterodyne grating interferometry measurement system
UNIV TSINGHUA2 citations71
US9903704B2Feb 27, 2018
Three-DOF heterodyne grating interferometer displacement measurement system
UNIV TSINGHUA2 citations71
US9879979B2Jan 30, 2018
Heterodyne grating interferometer displacement measurement system
UNIV TSINGHUA4 citations71
US9869857B2Jan 16, 2018
Optical grating phase modulator for laser interference photoetching system
UNIV TSINGHUA0 citations51
US12393127B2Aug 19, 2025
Exposure light beam phase measurement method in laser interference photolithography, and photolithography system
UNIV TSINGHUA0 citations50
US12038690B2Jul 16, 2024
Laser interference photolithography system
UNIV TSINGHUA0 citations50
US11703361B2Jul 18, 2023
Five-degree-of-freedom heterodyne grating interferometry system
UNIV TSINGHUA0 citations50
US9885556B2Feb 6, 2018
Dual-frequency grating interferometer displacement measurement system
UNIV TSINGHUA1 citations50
US11940349B2Mar 26, 2024
Plane grating calibration system
UNIV TSINGHUA0 citations49
US12346030B2Jul 1, 2025
Device and method for regulating and controlling incident angle of light beam in laser interference lithography
UNIV TSINGHUA0 citations48
US11525673B2Dec 13, 2022
Five-degree-of-freedom heterodyne grating interferometry system
UNIV TSINGHUA0 citations47
US12189300B2Jan 7, 2025
Scanning interference lithographic system
UNIV TSINGHUA0 citations46
US12332053B2Jun 17, 2025
Heterodyne grating interferometry system based on secondary diffraction
UNIV TSINGHUA0 citations45